Work

Future of planar self-aligned block oxide based MOSFET technology

Year: 2009

Type: conference-paper

Source: IEEE International Conference on IC Design and Technology (ICICDT)

DOI: 10.1109/icicdt.2009.5166291

Authors: Jyi-Tsong Lin, Yi-Chuen Eng, Chih-Hao Kuo, Tzu-Feng Chang, Chih-Hung Sun, Po-Hsieh Lin, Hsien-Nan Chiu, Hsuan-Hsu Chen

Institution: National Sun Yat-sen University

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2104874569

FWCI:

Cites: 9

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Related to: 10