Work

A new and improved borderless contact (BLC) structure for high-performance Ti-salicide in sub-quarter micron CMOS devices

Year: 2000

Type: article

Source: IEEE Electron Device Letters

DOI: 10.1109/55.847375

Authors: Wen-Chau Liu, Kong-Beng Thei, Wei-Chou Wang, Hsi-Jen Pan, Shou-Gwo Wuu, Ming-Ta Lei, Chung-Shu Wang, Shiou-Ying Cheng

Institutions: National Cheng Kung University, Taiwan Semiconductor Manufacturing Company (Taiwan), Asia Eastern University of Science and Technology

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2113604576

FWCI: 1.414

Cites: 10

Cited by: 11

Related to: 10