Work

Fabrication of nanodot array molds by using an inorganic electron-beam resist and a postexposure bake

Year: 2009

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.3253649

Authors: Tetsuro Manabe, Jun Taniguchi, Kiyoshi Ishikawa

Institutions: Tokyo University of Science, Tokyo Ohka Kogyo (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2114881997

FWCI: 0.258

Cites: 10

Cited by: 3

Related to: 10