ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone
Year: 2005
Type: article
DOI: 10.1149/1.1859631
Authors: Xinye Liu, Sasangan Ramanathan, Ana Longdergan, Anuranjan Srivastava, Eddie Lee, Thomas E. Seidel, Jeffrey T. Barton, Dawen Pang, Roy G. Gordon
Institution: Harvard University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2118921812