Work

Level-specific lithography optimization for 1-Gb DRAM

Year: 2000

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/66.827347

Authors: A.K. Wong, R. Ferguson, S. Mansfield, A. Molless, D. Samuels, R. Schuster, A. Thomas

Institution: IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2119081900

FWCI: 7.339

Cites: 51

Cited by: 110

Related to: 10