Work

Process technology for 3D-CMOS devices

Year: 1989

Type: conference-paper

Source: IEEE SOS/SOI Technology Conference

DOI: 10.1109/soi.1989.69771

Authors: R. Buchner, W. van der Wel, K. Haberger, S. Seitz, J. Weber, P. Seegebrecht

Institutions: Philips (Germany), Fraunhofer-Gesellschaft

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2124162138

FWCI: 1.438

Cites:

Cited by: 5

Related to: 10