Work

Model-based control of rapid thermal processing for semiconductor wafers

Year: 2004

Type: conference-paper

Source: Proceedings of the ... American Control Conference/Proceedings of the American Control Conference

DOI: 10.23919/acc.2004.1383921

Authors: J.L. Ebert, D. de Roover, L.L. Porter, V.A. Lisiewicz, S. Ghosal, R.L. Kosut, A. Emami-Naeini

Institution: SC Solutions (United States)

Language: English

Topic: Advanced Control Systems Optimization

Subfield: Control and Systems Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2136404068

FWCI: 0.382

Cites: 12

Cited by: 17

Related to: 10