Work

Optimized Overlay Metrology Marks: Theory and Experiment

Year: 2004

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2004.826955

Authors: M. Adel, M. Ghinovker, B. Golovanevsky, P. Izikson, E. Kassel, D. Yaffe, A.M. Bruckstein, R. Goldenberg, Y. Rubner, M. Rudzsky

Institutions: KLA (Israel), Technion – Israel Institute of Technology

Language: English

Topic: Advanced Measurement and Metrology Techniques

Subfield: Mechanical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2142425355

FWCI: 4.212

Cites: 16

Cited by: 39

Related to: 10