Work

Table-top microscope for at-wavelength inspection of extreme ultraviolet lithography mask

Year: 2009

Type: conference-paper

Source: IEEE Lasers and Electro-Optics Society Annual Meeting (LEOS)

DOI: 10.1109/leos.2009.5343475

Authors: Fernando Brizuela, Yong Wang, Courtney A. Brewer, Francesco Pedaci, Weilun Chao, Erik H. Anderson, Yanwei Liu, Kenneth A. Goldberg, Patrick Naulleau, Przemyslaw Wachulak, Mario C. Marconi, David T. Attwood, Jorge J. Rocca, Carmen S. Menoni

Institutions: Colorado State University, Lawrence Berkeley National Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2154199586

FWCI:

Cites: 9

Cited by: 3

Related to: 10