Work

Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

Year: 2013

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.4837335

Authors: V. V. Medvedev, R. W. E. van de Kruijs, A. E. Yakshin, N. N. Novikova, V. M. Krivtsun, E. Louis, A. M. Yakunin, F. Bijkerk

Institutions: Dutch Institute for Fundamental Energy Research, Institute of Spectroscopy, University of Twente, ASML (Netherlands)

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2155145451

FWCI: 0.559

Cites: 24

Cited by: 14

Related to: 10