Work

High-Deposition-Rate Atomic Layer Deposition of Thulium Oxide from TmCp3and H2O

Year: 2013

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/2.056311jes

Authors: Eugenio Dentoni Litta, Per-Erik Hellström, Christoph Henkel, Sven Valerio, Anders Hallén, Mikael Östling

Institution: KTH Royal Institute of Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: European Commission

OpenAlex ID: W2155955729

FWCI: 2.2

Cites: 24

Cited by: 21

Related to: 10