Work

Mechanism of copper underpotential deposition at Pt(hkl)-electrodes: Quantum-chemical modelling

Year: 2008

Type: article

Source: Russian Journal of Electrochemistry

DOI: 10.1134/s1023193508060104

Authors: A. I. Danilov, R. R. Nazmutdinov, T. T. Zinkicheva, E. B. Molodkina, A. V. Rudnev, Yu. M. Polukarov, J. M. Feliu

Institutions: Russian Academy of Sciences, Frumkin Institute of Physical Chemistry and Electrochemistry Russian Academy of Sciences, Kazan State Technological University, University of Alicante

Language: English

Topic: Electrodeposition and Electroless Coatings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Russian Foundation for Basic Research

OpenAlex ID: W2170307178

FWCI: 1.088

Cites: 31

Cited by: 16

Related to: 10