Work

Notching Effect on Metal Etch: A Very Simple Predictive Model

Year: 2005

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2005.852096

Authors: G. Garozzo, F. Beffumo, A. LaMagna

Institutions: STMicroelectronics (Italy), Institute for Microelectronics and Microsystems

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2170840052

FWCI: 0.307

Cites: 7

Cited by: 3

Related to: 10