Work

Towards New Interferometer Technology for Surface Metrology

Year: 2012
Type: conference-paper
Abstract: There is an increasing requirement from manufacturing industries for improved technologies to measure surface topography. New instruments have to be accurate; robust to be used on the industry floor; non-invasive; automatic; and sufficiently fast to be used in real time as well as to simultaneously measure over a large area. The industrial applications are plenty: On-line quality control of machined parts, Direct feed back to the manufacturing process, Analysis and selection of surface texture/structure. This paper presents new developments in interferometer techniques for new robust area-based topographic instruments.
Language: English
Subfield: Instrumentation
Open Access status: green
OpenAlex ID: W223301371
FWCI:
Cites: 1
Cited by: 2
Related to: 10