Work

Reverse Design of Photomask for Optimum Fidelity and Process Margin in Optical Lithography

Year: 1997

Type: article

Source: 대한전자공학회 학술대회

Authors: Yong Ho Oh, Sung Woo Lim, Jai Cheol Lee

Language: Korean

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2245682140

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