Work

Optical wafer metrology sensors for process-robust CD and overlay control in semiconductor device manufacturing

Year: 2016

Type: article

Source: Surface Topography Metrology and Properties

DOI: 10.1088/2051-672x/4/2/023001

Author: Arie J den Boef

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2279895124

FWCI: 3.717

Cites: 39

Cited by: 131

Related to: 10