Investigation of microstructure evolution during self-annealing in thin Cu films by combining mesoscale level set and ab initio modeling
Year: 2016
Type: article
Authors: Håkan Hallberg, Pär A.T. Olsson
Institutions: Lund University, Malmö University
Language: English
Subfield: Metals and Alloys
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
Funder: Vetenskapsrådet
OpenAlex ID: W2288640321
