Formation of nc-Si in SiOx by Soft X-ray Irradiation
Year: 2014
Type: article
Source: 電子情報通信学会技術研究報告. EID, 電子ディスプレイ
Authors: Fumito Kusakabe, Shota Hirano, Akira Heya, Matsuo Naoto, Kazuhiro Kanda, Takayasu Mochizuki, Miyamoto Shuji, Kazuyuki Kohama, Kazuhiro Ito
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2289218855