NXT:1980Di immersion scanner for 7nm and 5nm production nodes
Year: 2016
Type: conference-paper
DOI: 10.1117/12.2220589
Authors: Roelof de Graaf, Stefan Weichselbaum, Richard Droste, Matthew McLaren, Bert Koek, Wim de Boeij
Institution: ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2298021171