Work

Stamp degradation for high volume UV enhanced substrate conformal imprint lithography (UV-SCIL)

Year: 2016

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/j.mee.2016.01.018

Authors: M.J. Haslinger, M.A. Verschuuren, R. van Brakel, J. Danzberger, I. Bergmair, M. Mühlberger

Institutions: PROFACTOR GmbH (Austria), Philips (Netherlands), Sony Digital Audio Disc Corporation (Austria)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Klima- und Energiefonds

OpenAlex ID: W2298557017

FWCI: 1.198

Cites: 11

Cited by: 14

Related to: 10