Work

A Simulation Study on the Effect of Cross-Linking Agent Concentration for Defect Tolerant Demolding in UV Nanoimprint Lithography

Year: 2012

Type: article

Source: Langmuir

DOI: 10.1021/la300256k

Authors: Alborz Amirsadeghi, Jae Jong Lee, Sunggook Park

Institutions: Louisiana State University, Korea Institute of Machinery & Materials

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2319652015

FWCI: 2.36

Cites: 61

Cited by: 33

Related to: 10