Work

Study of EUVL patterned mask inspection tool for half-pitch (hp) 16nm-11nm node

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2085694

Authors: Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Shoji Yoshikawa, Kenichi Karimata, Kenji Terao

Institution: Ebara (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2320479233

FWCI: 1.249

Cites: 17

Cited by: 3

Related to: 10