Year: 2012
Type: conference-paper
Abstract: Silicon carbide (SiC), in bulk or film form, has been shown as a promising material to replace the silicon as sensing element in devices for harsh environments. This has motivated several studies on growth and characterization of SiC thin films on different substrates such as silicon, silicon dioxide (SiO2), aluminum nitride (AlN) and silicon nitride (Si3N4), among others. However, less attention has been given to the investigation on how substrates affect the piezoresistive properties of SiC thin films. In this work, we have investigated the effect of substrates on the piezoresistive properties of SiC thin films produced by magnetron sputtering. Three types of substrates were utilized: (100) monocrystalline silicon, AlN on silicon and thermally oxidized silicon. Test structures were fabricated using photolithography, metallization lift-off and RIE (reactive ion etching) processes in order to perform piezoresistive characterization of the SiC samples produced.
Source: ECS Transactions
DOI: 10.1149/1.3694474
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W2330103470