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高圧アニールプロセスでの銅配線熱応力評価 (特集:薄膜技術)
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Year:
2002
Type:
article
Source:
R&D神戸製鋼技報
Authors:
隆夫 井上,
亜希 宮垣,
隆 大西
Language:
Japanese
Topic:
Copper Interconnects and Reliability
Subfield:
Electronic, Optical and Magnetic Materials
Field:
Materials Science
Domain:
Physical Sciences
Open Access status:
closed
OpenAlex ID:
W234420575
FWCI:
Cites:
Cited by:
Related to:
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