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Process Optimization to Improve Anti-program Disturb Performance in Split-gate Flash

Year: 2015

Type: article

Source: Electronics & Packaging

Author: Rulin Zhou

Institutions: Semiconductor Manufacturing International (Italy), Semiconductor Manufacturing International (China)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2365754104

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