Work

Combining plasma profiling TOFMS with TOF-SIMS depth profiling for microelectronic applications

Year: 2016

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/1.4943513

Authors: Agnès Tempez, Sébastien Legendre, Jean-Paul Barnes, Emmanuel Nolot

Institutions: Horiba (France), Commissariat à l'Énergie Atomique et aux Énergies Alternatives, CEA Grenoble, Laboratoire d'Électronique des Technologies de l'Information, Université Grenoble Alpes

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2366413360

FWCI: 1.283

Cites: 19

Cited by: 15

Related to: 10