Work

20115 Stress analysis of low-k material interface during CMP

Year: 2006

Type: conference-paper

Source: The Proceedings of Conference of Kanto Branch

DOI: 10.1299/jsmekanto.2006.12.51

Authors: Yoshihiro Mochizuki, Hideki Shibata, Manabu Tsujimura, Hirokuni Hiyama

Institutions: Toshiba (Japan), Ebara (Japan)

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2401145489

FWCI: 1.047

Cites:

Cited by: 1

Related to: 10