Work

Leading Wave Crystallization from Fast Moving Molten Zone Formed by Micro-Thermal-Plasma-Jet Irradiation to Amorphous Silicon Films

Year: 2012

Type: conference-paper

Source: International Conference on Solid State Devices and Materials (SSDM)

DOI: 10.7567/ssdm.2012.i-2-4

Authors: S. Hayashi, Y. Fujita, T. Kamikura, K. Sakaike, M. Ikeda, H. Hanafusa, S. Higashi

Institution: Hiroshima University

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2461836588

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