Work

Thermal Properties of a Chemically Amplified Resist Resin

Year: 1995

Type: conference-paper

Source: ACS symposium series

DOI: 10.1021/bk-1994-0579.ch013

Authors: Koji Asakawa, Akinori Hongu, Naohiko Oyasato, Makoto Nakase

Institution: Toshiba (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2489536331

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