Work

High-brightness laser-induced EUV source based on tin plasma with an unlimited lifetime of electrodes

Year: 2016

Type: article

Abstract: Characteristics of a source of laser-induced radiation in the extreme ultraviolet (EUV) range, obtained in a discharge between two jets of liquid tin, are investigated. The possibility of designing a high-brightness EUV source on this basis for employing in mask inspection techniques in projection EUV lithography is demonstrated. The average efficiency of converting the electric energy to radiation in the spectral range of is approximately sr with the size of emitting plasma . The possibility of producing a EUV source with a brightness of about is demonstrated.

Source: Quantum Electronics

DOI: 10.1070/qe2016v046n01abeh015657

Authors: A Yu Vinokhodov, V M Krivtsun, A A Lash, V M Borisov, O F Yakushev, K N Koshelev

Institutions: EUV Labs (Russia), Russian Academy of Sciences, Institute of Spectroscopy, Troitsk Institute for Innovation and Fusion Research, P.N. Lebedev Physical Institute of the Russian Academy of Sciences

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W2520178751

FWCI: 0.916

Cites: 4

Cited by: 13

Related to: 10