Work

Proximity effect in electron beam lithography

Year: 2004

Type: conference-paper

Source: IEEE International Conference on Solid-State and Integrated Circuit Technology

DOI: 10.1109/icsict.2004.1435073

Authors: Liming Ren, Baoqin Chen

Institutions: Peking University, Chinese Academy of Sciences, Institute of Microelectronics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2536614252

FWCI:

Cites: 7

Cited by: 31

Related to: 10