Work

Optimization of photo acid generator in the PAG-bonded resist

Year: 2007

Type: conference-paper

Source: International Microprocesses and Nanotechnology Conference (MNC)

DOI: 10.1109/imnc.2007.4456288

Authors: Yasuyuki Fukkushima, Hiroo Kinoshita, Ryuji Ohnishi, Takeo Watanabe, Hideaki Shiotani, Shouta Suzuki, Masamichi Hayakawa, Yusuke Endo, Tomotaka Yamanaka, Shinichi Yusa

Institutions: University of Hyogo, TOYO Gosei Co., Ltd. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2546901244

FWCI:

Cites:

Cited by:

Related to: 10