Work

FinFET-induced anisotropy in printing of implantation shapes

Year: 2017

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2258346

Authors: Xiren Wang, Yuri Granik, Nikolay Elistratov, Christian Zuniga, Ana-Maria Armeanu, Junghwan Choi, Youngseok Woo

Institutions: Mentor Graphics (United States), Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2597312784

FWCI: 0.388

Cites: 8

Cited by: 1

Related to: 10