Work

Process, design rule, and layout co-optimization for DSA based patterning of sub-10nm Finfet devices

Year: 2017

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2257313

Authors: Joydeep Mitra, Andres Torres, David Z. Pan

Institutions: Mentor Graphics (United States), The University of Texas at Austin

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2601339652

FWCI: 3.258

Cites: 10

Cited by: 4

Related to: 10