Work

Experimental investigation of SF6–O2 plasma for advancement of the anisotropic Si etch process

Year: 2017

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.4981785

Authors: Khaled A. Alshaltami, Muhammad Morshed, Cezar Gaman, Jim Conway, Stephen Daniels

Institution: Dublin City University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Ministère de l'Education Nationale, de l'Enseignement Superieur et de la Recherche

OpenAlex ID: W2606605072

FWCI: 0.558

Cites: 25

Cited by: 11

Related to: 10