Work

Formation of Low-Resistivity Nickel Germanide Using Atomic Layer Deposited Nickel Thin Film

Year: 2017

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2017.2694456

Authors: Hyun Jun Ahn, Jungmin Moon, Yujin Seo, Tae In Lee, Choong-Ki Kim, Wan Sik Hwang, Hyun-Yong Yu, Byung Jin Cho

Institutions: Korea Advanced Institute of Science and Technology, Korea Aerospace University, Korea University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2607528792

FWCI: 1.032

Cites: 21

Cited by: 16

Related to: 10