Work

Evaluation of thermal resistance at the silicon/diamond interface through infrared photothermal radiometry

Year: 2012

Type: conference-paper

Source: International Congress on Applications of Lasers & Electro-Optics (ICALEO)

DOI: 10.2351/1.5062397

Authors: Thomas Guillemet, Jean-Luc Battaglia, Andrzej Kusiak, Andrea Cappella, Jean-Marc Heintz, Namas Chandra, Jean-François Silvain, Yongfeng Lu

Institutions: University of Nebraska–Lincoln, Centre National de la Recherche Scientifique, Institut de Chimie de la Matière Condensée de Bordeaux, Université Bordeaux-I

Language: English

Topic: Thermal properties of materials

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2612207293

FWCI: 1.447

Cites: 8

Cited by: 1

Related to: 10