Work

Depth Profiles of P and H atom at a-Si/c-Si Interface by Plasma Ion Implantation

Year: 2017

Type: article

Source: The Japan Society of Applied Physics

Authors: Koichi Koyama, Noboru Yamaguchi, Miwa Tanaka, Hideo Suzuki, Keisuke Ohdaira, Hideki Matsumura

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2616466451

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