Work

Effect of oxygen partial pressure in deposition ambient on the properties of RF magnetron sputter deposited Gd_2O_3 thin films

Year: 2017

Type: article

Source: Applied Optics

DOI: 10.1364/ao.56.006114

Authors: S. Maidul Haque, Rajnarayan De, S. Tripathi, C. Mukherjee, A. K. Yadav, Dibyendu Bhattacharyya, S. N. Jha, N. K. Sahoo

Institutions: Bhabha Atomic Research Centre, Raja Ramanna Centre for Advanced Technology

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2736506973

FWCI: 0.407

Cites: 42

Cited by: 13

Related to: 10