Work

Improved thermoelectric properties of nanocrystalline hydrogenated silicon thin films by post-deposition thermal annealing

Year: 2017

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2017.09.047

Authors: Joana Loureiro, Tiago Mateus, Sergej Filonovich, Marisa Ferreira, Joana Figueira, Alexandra Rodrigues, Brian F. Donovan, Patrick E. Hopkins, Isabel Ferreira

Institutions: Centro de Investigação em Materiais, Universidade Nova de Lisboa, United States Naval Academy, University of Virginia

Language: English

Topic: Advanced Thermoelectric Materials and Devices

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: green

OpenAlex ID: W2759010404

FWCI: 0.636

Cites: 30

Cited by: 14

Related to: 10