Ultrahigh PID-Resistance for Mono Silicon PERC Solar Cells by Using Industrial Mass-Production Technology
Year: 2016
Type: article
Abstract: In this paper, using the industrial mass-production technology on commercially available 156 mm × 156 mm p-type Czochralski-grown crystalline mono silicon wafers, the best cell efficiencies more than 21% are demonstrated. We improved the solar cell devices by improving front side anti-reflection coating and back side process parameter which results in higher open circuit voltages and short circuit current. Besides, the mono PERC solar cell process pass the UL/ITRI potential induced degradation (PID) test which condition was indicated to be 85 degree Celsius and 85% RH in climatic chamber apply -1500 V for 300 hours.
Source: EU PVSEC
Authors: Kuo, C.-W., Kuan, T.-M., Wu, L.-G., Huang, C.-C., Peng, H.-Y., Yu, C.-Y.
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W2762443046
