Work

Ultrahigh PID-Resistance for Mono Silicon PERC Solar Cells by Using Industrial Mass-Production Technology

Year: 2016
Type: article
Abstract: In this paper, using the industrial mass-production technology on commercially available 156 mm × 156 mm p-type Czochralski-grown crystalline mono silicon wafers, the best cell efficiencies more than 21% are demonstrated. We improved the solar cell devices by improving front side anti-reflection coating and back side process parameter which results in higher open circuit voltages and short circuit current. Besides, the mono PERC solar cell process pass the UL/ITRI potential induced degradation (PID) test which condition was indicated to be 85 degree Celsius and 85% RH in climatic chamber apply -1500 V for 300 hours.
Source: EU PVSEC
Language: English
Open Access status: green
OpenAlex ID: W2762443046
FWCI:
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Cited by: 1
Related to: 10