A novel method to fast fix the post OPC weak-points through Calibre eqDRC application
Year: 2018
Type: conference-paper
Source: SPIE Optical Microlithography
DOI: 10.1117/12.2292695
Authors: YaDong Jin, ShiZhi Lyu, Cong Lu, ZeXi Deng
Institution: Semiconductor Manufacturing International (China)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2789347293