Year: 2018
Type: article
Abstract: This work reports a simple method for fabrication of highly sensitive photo-detector based on uniform nano-crystalline CdS thick films deposited on glass substrate by spray pyrolysis technique. The presented photo-detector platform contains CdS thick films (3, 6, 9, 12 and 15 μ m) and Ag electrode structure. In order to detect incident light signals, changes in electrical signals were measured (conductance and current). For photo-detection, the current response between the 'ON' and 'OFF ' states of incident light was measured when exposed to different wavelengths ranging from 450 to 700 nm. The fabricated device showed significant detection of low-power (∼5 mW cm −2 ) light for optimized film thickness of 12 μ m. Time response measurements at different wavelength show fast response and decay time (25 ms) and high photo sensitivity (1123) at low bias voltage, indicating good quality of the deposited 12 μ m thick CdS film.
Source: Materials Research Express
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W2806232048