Work

Application of scatterometry-based machine learning to control multiple electron beam lithography: AM: Advanced metrology

Year: 2018

Type: conference-paper

Source: ASMC proceedings

DOI: 10.1109/asmc.2018.8373222

Authors: Nivea Figueiro, Francisco Sanchez, Roy Koret, Michael Shifrin, Yoav Etzioni, Shay Wolfling, Matthew Sendelbach, Yoann Blancquaert, Thibault Labbaye, Guido Rademaker, Jonathan Pradelles, Lucie Mourier, Stephane Rey, Laurent Pain

Institutions: Nova Measuring Instruments (Israel), Commissariat à l'Énergie Atomique et aux Énergies Alternatives, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2808212401

FWCI: 0.801

Cites: 12

Cited by: 7

Related to: 10