Work

Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials

Year: 2018

Type: conference-paper

Source: ASMC proceedings

DOI: 10.1109/asmc.2018.8373194

Authors: Pavan Samudrala, Gregory Hart, Yen-Jen Chen, Lokesh Subramany, Haiyong Gao, Nyan Aung, Woong Jae Chung, Blandine Minghetti, Rajan Mali, Seva Khikhlovskyi, Pieter Heres

Institutions: GlobalFoundries (United States), ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2808660604

FWCI:

Cites: 2

Cited by: 1

Related to: 10