Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
Year: 2018
Type: conference-paper
DOI: 10.1117/12.2500086
Authors: Richard J. van Haren, Steffen Steinert, Orion Mouraille, Koen D’havé, Leon van Dijk, Ronald Otten, Dirk Beyer
Institutions: ASML (Netherlands), IMEC
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2808925698