Work

Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO 2 films obtained from metal halide and amide precursors

Year: 2018

Type: article

Source: Journal of Materials Chemistry C

DOI: 10.1039/c8tc01476k

Authors: Il-Kwon Oh, Bo-Eun Park, Seunggi Seo, Byung Chul Yeo, Jukka Tanskanen, Han-Bo-Ram Lee, Woo-Hee Kim, Hyungjun Kim

Institutions: Yonsei University, Korean Association Of Science and Technology Studies, Korea Institute of Science and Technology, University of Eastern Finland, Incheon National University, Jeonbuk National University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Chonbuk National University, Yonsei University, Ministry of Trade, Industry and Energy, National Research Foundation of Korea, Ministry of Science ICT and Future Planning, Korea Evaluation Institute of Industrial Technology

Awards: G131919595, G3040881300, G5996488103, G862588566, G8640816397

OpenAlex ID: W2809782173

FWCI: 1.818

Cites: 75

Cited by: 56

Related to: 10