Formation, processing and characterization of Co–Sn intermetallic compounds for potential integration in 3D interconnects
Year: 2015
Type: article
Source: Microelectronic Engineering
Institutions: Intel (United States), IMEC, Tokyo Institute of Technology, KU Leuven
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W286144375
