Work

Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films

Year: 2018

Type: article

Source: Review of Scientific Instruments

DOI: 10.1063/1.5037408

Authors: Kosuke Takenaka, Yuichi Setsuhara, Jeon Geon Han, Giichiro Uchida, Akinori Ebe

Institutions: Joining and Welding Research Institute, The University of Osaka, Sungkyunkwan University, EMD Corporation (Japan)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2885519201

FWCI: 0.191

Cites: 41

Cited by: 4

Related to: 10