Work

Cleaning of High Aspect Ratio STI Structures for Advanced Logic Devices by Implementation of a Surface Modification Drying Technique

Year: 2018

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/www.scientific.net/ssp.282.190

Authors: Farid Sebaai, Guy Vereecke, Xiu Mei Xu, Sylvain Baudot, Fumihiro Amemiya, Kana Komori, Frank Holsteyns

Institutions: IMEC, Central Glass (Japan), SCREEN Semiconductor Solutions Co., Ltd. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2889530357

FWCI: 0.287

Cites: 5

Cited by: 10

Related to: 10